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수소 플라즈마를 이용한 저온(≤ 150 °C) 고품질 sputtered SiO2 박막 형성
- Title
- 수소 플라즈마를 이용한 저온(≤ 150 °C) 고품질 sputtered SiO2 박막 형성
- Authors
- CHUNG, YOONYOUNG; SEO, TAEWON; JEON, GILSU; PARK, HYUK; YUN, JUYOUNG; SEONGMIN, PARK; SUWON, SEONG
- Date Issued
- 2021-01-27
- Publisher
- 삼성전자, 한국반도체산업협회, 한국반도체연구조합
- Article Type
- Conference
- Citation
- 한국반도체학술대회, 2021-01-27
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Related Researcher
- 정윤영CHUNG, YOONYOUNG
- Dept of Electrical Enginrg