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dc.contributor.authorPark, YBko
dc.contributor.authorRhee, SWko
dc.contributor.authorImaizumi, Yko
dc.contributor.authorUrisu, Tko
dc.date.available2015-06-25T02:09:03Z-
dc.date.created2009-03-16-
dc.date.issued1996-01-
dc.identifier.citationJOURNAL OF APPLIED PHYSICS, v.80, no.2, pp.1236 - 1238-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000011098en_US
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/10459-
dc.description.statementofresponsibilityopenen_US
dc.format.extentpdfen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleStructural changes of silicon dioxide films caused by synchrotron irradiation-
dc.typeArticle-
dc.contributor.college화학공학과en_US
dc.author.googlePark, YBen_US
dc.author.googleRhee, SWen_US
dc.author.googleUrisu, Ten_US
dc.author.googleImaizumi, Yen_US
dc.relation.volume80en_US
dc.relation.issue2en_US
dc.relation.startpage1236en_US
dc.relation.lastpage1238en_US
dc.contributor.id10052631en_US
dc.publisher.locationUSen_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.contributor.nonIdAuthorPark, YB-
dc.contributor.nonIdAuthorImaizumi, Y-
dc.contributor.nonIdAuthorUrisu, T-
dc.identifier.wosidA1996UX15600092-
dc.date.tcdate2019-01-01-
dc.citation.endPage1238-
dc.citation.number2-
dc.citation.startPage1236-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume80-
dc.identifier.scopusid2-S2.0-0344146177-
dc.description.journalClass1-
dc.description.wostc5-

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