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Article
Remote plasma chemical vapour deposition of silicon films at low temperature with H-2 and He plasma gasesSCIESCOPUS

JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 32, no. 16, page. 1955 - 1962, 1999-08-21

Article
Remote plasma enhanced chemical vapor deposition of silicon films at low temperatures from Si2H6-H-2-SiF4SCIESCOPUS

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 143, no. 8, page. 2640 - 2645, 1996-08

Article
Role of Zscan4 in secondary murine iPSC derivation mediated by protein extracts of ESC or iPSCSCIESCOPUS

BIOMATERIALS, vol. 59, page. 102 - 115, 2015-08

Article
Structural changes of silicon dioxide films caused by synchrotron irradiationSCIESCOPUS

JOURNAL OF APPLIED PHYSICS, vol. 80, no. 2, page. 1236 - 1238, 1996-07-15

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