Open Access System for Information Sharing
All
Title
Author
Subject
Login
Library
Help
검색
HOME
Communities & Collections
Researchers
Title
Browse by Researchers
KIM, HYUNGJUN (김형준)
Dept of Materials Science & Engineering(신소재공학과)
Field(s)
Homepage
Loading...
Export
Journal Papers
(International)
Journal Papers
(Domestic)
Conference Papers
(International)
Conference Papers
(Domestic)
Journal Papers(International)
Journal Papers(Domestic)
Conference Papers(International)
Conference Papers(Domestic)
20 items
100 items
200 items
Show more items...
Keyword
atomic layer deposition:10||THINFILMS:6||SURFACES:6||CHEMICALVAPORDEPOSITION:6||Ru:5||FILMS:5||Atomic layer deposition:4||GLASS:4||TiO2:4||Photocatalyst:4||METAL:3||TA:3||OXIDE THINFILMS:3||GROWTH:3||NANOSTRUCTURES:3||ELECTRODE:3||osteoconductivity:2||conduction bands:2||SI:2||plasma materials processing:2||PLASMAENHANCED ALD:2||XENOGRAFT BIOOSS:2||TECHNOLOGY:2||TITANIUMDIOXIDE:2||BACTERIA:2||interface states:2||oxidation:2||COATINGS:2||hen eggshell:2||hafnium compounds:2||dielectric materials:2||oxygen exposure:2||hydrothermal treatment:2||MAXILLARY SINUS AUGMENTATION:2||CRITICALSIZE DEFECTS:2||HYDROXYAPATITE CERAMICS:2||OCTACALCIUM PHOSPHATE:2||ARRAYS:2||FABRICATION:2||ROOMTEMPERATURE:2||ALD:2||SPECTROSCOPY:2||SUBSTRATE:2||CVD:2||ADSORPTION:2||bone substitute:2||HUMAN EXTRACTION SOCKETS:2||CALCIUMCARBONATE:2||DIELECTRICS:2||Plasma enhanced atomic layer deposition:2||OXIDES:2||RU:2||ANORGANIC BOVINE BONE:2||SURFACE:2||PHOTOLYSIS:2||Xray photoelectron spectra:2||INVIVO:2||MEMORIES:2||ZINCOXIDE:2||WATER:2||leakage currents:2||NEXAFS:2||THICKNESS:2||RuCp2:2||CAPACITOR:2||GUIDED TISSUE REGENERATION:2||Selfcleaning effect:2||Polymer substrate:2||histomorphometry:2||IMMUNOASSAYS:1||Nanodevice:1||PHOTONIC CRYSTALS:1||NANOWIRE ARRAYS:1||IIIV SEMICONDUCTORS:1||InMnP:Zn:1||diluted magnetic semiconductor:1||SINGLECRYSTALS:1||LANTHANUM:1||Phase control:1||PULSEDLASER DEPOSITION:1||ORIENTATION:1||Cl2 exposure:1||TEMPERATURE:1||DEPENDENCE:1||INDIUMTINOXIDE:1||oxides:1||NANOTUBES:1||VAPORDEPOSITION:1||TA2O5:1||highresolution transmission electron microscopy:1||HFO2:1||AFM tip:1||electric field:1||nanocapacitor:1||graphene:1||TFTS:1||LINKEDIMMUNOSORBENTASSAY:1||SOLIDPHASE:1||ELISA:1||SELFASSEMBLED MONOLAYERS:1||KAPPA GATE DIELECTRICS:1||SEQUENTIAL SURFACEREACTIONS:1||Metal gate:1||CAPACITANCE:1||CMOS:1||nanorods:1||nickel:1||Films properties:1||AL FILMS:1||ZnO:1||RAY PHOTOELECTRONSPECTROSCOPY:1||TRANSPARENT:1||WIRES:1||TEMPERATUREDEPENDENCE:1||Xray diffration:1||NACO2O4:1||RuO2:1||MECHANISM:1||Organic thin film transistors:1||SUPERPARAMAGNETISM:1||OXYGEN:1||leakage current:1||dielectricreliability:1||interface state:1||DIFFUSION BARRIER PROPERTIES:1||CU METALLIZATION:1||TAN:1||RUTHENIUM:1||resistive switching:1||SRTIO3:1||COVALENT BINDING:1||magnetic materials:1||transparent conducting oxides:1||rf sputtering:1||SILICONGERMANIUM:1||ANODES:1||DIELECTRICCONSTANT:1||MOLECULARBEAM EPITAXY:1||FORCE MICROSCOPY:1||in situ nitridation:1||Cu interconnect technology:1||anodizing aluminum oxide:1||SWITCH:1||SUBSTRATETEMPERATURE:1||ANTIBODIES:1||Nanotechnology:1||Nanofabrication:1||FIELDEFFECT TRANSISTORS:1||liquid phase epitaxy:1||PARTICLES:1||SIZE:1||RUO2:1||Aldoped ZnO films:1||Metal oxide:1||ferromagnetic materials:1||TEMPLATE:1||roughness:1||RUELECTRODES:1||NONVOLATILE STORAGE DEVICES:1||NITROGEN:1||Aldoped zinc oxide:1||Thin film transistors:1||DEPOSITION:1||COBALT:1||Laser epitaxy:1||ELECTRICALPROPERTIES:1||EPITAXY:1||HETEROSTRUCTURES:1||BOTTOM ELECTRODE:1||SIO2:1||(BA:1||Xray photoelectron spectroscopy:1||INTERCONNECTS:1||NiO:1||ANODIZATION:1||Hall effect measurements:1||KINETICS:1||SI(100):1||Photoelectron spectroscopy:1||laser epitaxy:1||RUTHENIUM THINFILMS:1||CV measurements:1||ferroelectric domain:1||RELIABILITY:1||nanoscale devices:1||HIGHDENSITY:1||DNA MICROARRAYS:1||BIOTIN:1||SENSITIZED SOLARCELLS:1||Gate oxide:1||ATOMICLAYER DEPOSITION:1||INP:1||MN:1||Oxides:1||NANOLITHOGRAPHY:1||Effects of oxygen exposure:1||TRANSPARENT CONDUCTING OXIDES:1||CHLORINE:1||PHOTOEMISSIONSPECTROSCOPY:1||SILICON:1||SR)TIO3 CAPACITORS:1||DOMAINS:1||nitrogenoxygen mixture plasma:1||GATE DIELECTRICS:1||TANTALUM NITRIDE FILMS:1||COPPER:1||OXIDE:1||UV/VIS spectroscopy:1||LAYER:1||ANTIGEN:1||Nanotemplate:1||Interface roughness:1||HfO(2):1||cobalt:1||Crystal structure:1||NANOPARTICLES:1||Growth characteristics:1||Effects of growth temperature:1||transparent TFT:1||Si1xGex film:1||Selective epitaxial growth:1||SIGE:1||Contact resistance:1||LIGHTEMITTINGDIODES:1||TRANSISTORS:1||DEVICES:1||Xray diffraction:1||ELECTRODES:1||LITHOGRAPHY:1||nucleation:1||tantalum oxide:1||interfacial layer:1||NONVOLATILE MEMORY:1||Radiofrequency magnetron sputtering:1||PRESSURE:1||Selfassembly:1||NITRIDE INVERSE OPALS:1||OXIDE NANOTUBE ARRAYS:1||CARBON NANOTUBES:1||SENSORS:1||
Publication & Time Cited Count
(For the Last 5 years)
Browse
Communities & Collections
Researcher
Title
Login
Library
Help