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dc.contributor.author강봉구ko
dc.date.accessioned2018-06-21T13:43:40Z-
dc.date.available2018-06-21T13:43:40Z-
dc.date.created2009-03-27-
dc.date.issued1996-01-01-
dc.identifier.citation전자공학회 추계학술대회-
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/82664-
dc.publisher전자공학회-
dc.titleHF:H2O2:CH3COOH 용액을 이용한 실리콘-져마늄 에피막의 화학적 선택 식각-
dc.typeConference-
dc.type.rimsCONF-
dc.contributor.localauthor강봉구-
dc.citation.title전자공학회 추계학술대회-
dc.description.journalClass2-
dc.identifier.conferencecountryKO-

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 KANG, BONG KOO
Dept of Electrical Enginrg
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