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HF:H2O2:CH3COOH 용액을 이용한 실리콘-져마늄 에피막의 화학적 선택 식각

Title
HF:H2O2:CH3COOH 용액을 이용한 실리콘-져마늄 에피막의 화학적 선택 식각
Authors
강봉구
POSTECH Authors
강봉구
Date Issued
1-Jan-1996
Publisher
전자공학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/82664
Article Type
Conference
Citation
전자공학회 추계학술대회, 1996-01-01
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 KANG, BONG KOO
Dept of Electrical Enginrg
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