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Superior Recovery Characteristics of SiGe pMOSFETs under NBTI Stress

Title
Superior Recovery Characteristics of SiGe pMOSFETs under NBTI Stress
Authors
정윤하
POSTECH Authors
정윤하
Date Issued
25-Sep-2012
Publisher
The Japan Society of Applied Physics
URI
http://oasis.postech.ac.kr/handle/2014.oak/63811
Article Type
Conference
Citation
2012 International Conference on Solid State Devices and Materials, 2012-09-25
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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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