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In-Situ Control of Oxygen Vacancy Concentration by ALD for Resistive Switching Devices

Title
In-Situ Control of Oxygen Vacancy Concentration by ALD for Resistive Switching Devices
Authors
백성기박상준
Date Issued
20-Jun-2012
Publisher
ALD 2012
URI
http://oasis.postech.ac.kr/handle/2014.oak/63382
Article Type
Conference
Citation
12th International Conference on Atomic Layer Deposition, 2012-06-20
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