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Solid Phase Epitaxy SourceDrain을 이용한 50nm 크기의 Silicon Thin-Body SOI-NMOSFET의 제작에 관한 연구

Title
Solid Phase Epitaxy SourceDrain을 이용한 50nm 크기의 Silicon Thin-Body SOI-NMOSFET의 제작에 관한 연구
Authors
양종헌
Date Issued
2002
Publisher
포항공과대학교
URI
http://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001905991
http://141.223.5.61//handle/2014.oak/6212
Article Type
Thesis
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