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The Influence of Source/Drain Extension Region Profile and Spacer Length on Device Performance of Tri-Gate Body-tied FinFETs

Title
The Influence of Source/Drain Extension Region Profile and Spacer Length on Device Performance of Tri-Gate Body-tied FinFETs
Authors
김오현송재준문대현
POSTECH Authors
김오현
Date Issued
18-Nov-2009
Publisher
JAP
URI
http://oasis.postech.ac.kr/handle/2014.oak/61594
Article Type
Conference
Citation
International Microprocesses and Nanotechnology Conference, 2009-11-18
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 KIM, OHYUN
Dept of Electrical Enginrg
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