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RF Performance Degradation in 100-nm Metal Gate/High-k Dielectric nMOSFET by Hot Carrier Effects

Title
RF Performance Degradation in 100-nm Metal Gate/High-k Dielectric nMOSFET by Hot Carrier Effects
Authors
정윤하
POSTECH Authors
정윤하
Date Issued
16-Sep-2009
Publisher
IEEE
URI
http://oasis.postech.ac.kr/handle/2014.oak/61518
Article Type
Conference
Citation
2009 IEEE European Solid-State Device Research Conference, 2009-09-16
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정윤하JEONG, YOON HA
Dept of Electrical Enginrg
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