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Damage free removal of 10nm contaminant particles from a wafer surface using a supersonic CO2 particle beam

Title
Damage free removal of 10nm contaminant particles from a wafer surface using a supersonic CO2 particle beam
Authors
이진원김인호
POSTECH Authors
이진원
Date Issued
2-Jun-2011
Publisher
대한기계학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/59945
Article Type
Conference
Citation
US-Korea Joint Symposium on nano technology, 2011-06-02
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이진원LEE, JIN WON
Dept of Mechanical Enginrg
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