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Chemical vapor deposition of TaCxNy films using tert-butylimido tris-diethylamido tantalum (TBTDET): reaction mechanism and film charateristics

Title
Chemical vapor deposition of TaCxNy films using tert-butylimido tris-diethylamido tantalum (TBTDET): reaction mechanism and film charateristics
Authors
이시우김석훈
Date Issued
5-Nov-2009
Publisher
한국재료학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/56765
Article Type
Conference
Citation
2009년도 한국재료학회 추계학술발표대회 및 제17회 신소재 심포지엄, 2009-11-05
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