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DC and Reliability Characteristics of 45nm Node MOSFETs with using HfSiON/TiN Gate Stacks

Title
DC and Reliability Characteristics of 45nm Node MOSFETs with using HfSiON/TiN Gate Stacks
Authors
백록현박민상홍승호최현식최길복송승현이경택김재철사공현철이희덕정윤하
POSTECH Authors
백록현
Date Issued
18-Feb-2009
Publisher
대한전자공학회
URI
http://oasis.postech.ac.kr/handle/2014.oak/49831
Article Type
Conference
Citation
16th Korean Conference on Semiconductors (2009), 2009-02-18
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 BAEK, ROCK HYUN
Dept of Electrical Enginrg
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