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The Performance of HfSiON/TiN Gate Stack MOSFETs for 45 nm Node LSTP Application Using Conventional Fabrication Process

Title
The Performance of HfSiON/TiN Gate Stack MOSFETs for 45 nm Node LSTP Application Using Conventional Fabrication Process
Authors
백록현박민상이경택최길복홍승호최현식송승현김재철사공현철정성우이희덕정윤하
POSTECH Authors
백록현
Date Issued
20-Oct-2008
Publisher
IEEE
URI
http://oasis.postech.ac.kr/handle/2014.oak/49494
Article Type
Conference
Citation
IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20
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 BAEK, ROCK HYUN
Dept of Electrical Enginrg
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