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Reliability of HfO2/SiO2 Dielectric with Strain Engineering using CESL Stressor

Title
Reliability of HfO2/SiO2 Dielectric with Strain Engineering using CESL Stressor
Authors
백록현김재철이경택송승현홍승호박민상최현식최길복사공현철정성우강창용정윤하
POSTECH Authors
백록현
Date Issued
26-Apr-2009
Publisher
IEEE
URI
http://oasis.postech.ac.kr/handle/2014.oak/49490
Article Type
Conference
Citation
IEEE IRPS(2009), 2009-04-26
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 BAEK, ROCK HYUN
Dept of Electrical Enginrg
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