| Issue Date | Title |
|---|---|
| 2015-Jul | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 162, no. 9, page. 713 - 718, 2015-07 Park, J; Song, H; Lee, EK; Oh, JH; Yong, K |
| 2008-Jan | Resistance switching behaviors of hafnium oxide films grown by MOCVD for nonvolatile memory applicationsPDF link JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 2, page. H92 - H96, 2008-01 Lee, S; Kim, WG; Rhee, SW; Yong, K |
| 2015-Mar | Photoelectrochemical Hydrogen Generation Using C-dot/ZnO Hierarchical Nanostructure as an Efficient PhotoanodePDF link JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 162, no. 6, page. 366 - 370, 2015-03 Heejin Kim; Woosung Kwon; Mingi Choi; Rhee, SW; Yong, K |
| 2002-Jan | Precursors for deposition of strontium bismuth tantalate films by direct liquid injection-metallorganic chemical vapor depositionPDF link JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 149, no. 1, page. C44 - C49, 2002-01 Kang, SW; Yang, KJ; Yong, KJ; Rhee, SW |
| 2002-Jan | Direct liquid injection metallorganic chemical vapor deposition of ZrO2 thin films using Zr(dmae)(4) as a novel precursorPDF link JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 149, no. 1, page. C23 - C27, 2002-01 Na, JS; Kim, DH; Yong, K; Rhee, SW |
| 1992-Jan | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 139, page. 1714 - 1720, 1992-01 KANG, IS; OH, HJ; RHEE, SW |
| 2015-Sep | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 162, no. 09, page. H713 - H718, 2015-09 Park, Jinjoo; Song, Hongseon; Lee, Eun Kwang; OH, JOON HAK; YONG, KIJUNG |
| 2007-Jan | Controlled electrochemical dissolution of anodic aluminum oxide for preparation of open-through pore structuresPDF link JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 154, no. 10, page. C553 - C557, 2007-01 Zhao, XW; Seo, SK; Lee, UJ; Leez, KH |
| 2010-Jan | Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalumPDF link JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 157, no. 6, page. H652 - H656, 2010-01 Kim, SH; Song, MK; Rhee, SW |
| 2008-Jan | Pentacene thin-film transistor with NiOx as a source/drain electrode deposited with sputteringPDF link JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 11, page. H899 - H902, 2008-01 Yun, DJ; Rhee, SW |
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