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Issue Date	Title
1998-Jan	Characterization of proximity correction in 100-nm-regime X-ray lithography JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 37, no. 12B, page. 6824 - 6829, 1998-01 Yi, M; Seo, E; Seo, Y; Lee, K; Kim, O
2000-Jan	Evaluation of effective image blurring factors in the synchrotron proximity X-ray lithography JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 39, no. 12B, page. 6942 - 6946, 2000-01 Seo, Y; Kim, O

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