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THIN FILM PROCESSING BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Title
THIN FILM PROCESSING BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION
Authors
제정호
POSTECH Authors
제정호
Date Issued
Jun-1989
Publisher
대한금속학회회보
URI
http://oasis.postech.ac.kr/handle/2014.oak/40137
Article Type
Article
Citation
BULLETIN OF THE KOREAN INSTITUTE OF METALS AND MATERIALS, vol. 2, no. 1, page. 9 - 19, 1989-06
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 JE, JUNG HO
Dept of Materials Science & Enginrg
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