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Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved electron beam lithography overlay

Title
Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved electron beam lithography overlay
Authors
Gwanho YoonInki KimSunae SoJungho MunMinkyung KimRho, J.
POSTECH Authors
Rho, J.
Date Issued
Jul-2017
Publisher
Nature Publishing Group
Abstract
Nanofabrication techniques are essential for exploring nanoscience and many closely related research fields such as materials, electronics, optics and photonics. Recently, three-dimensional (3D) nanofabrication techniques have been actively investigated through many different ways, however, it is still challenging to make elaborate and complex 3D nanostructures that many researchers want to realize for further interesting physics studies and device applications. Electron beam lithography, one of the two-dimensional (2D) nanofabrication techniques, is also feasible to realize elaborate 3D nanostructures by stacking each 2D nanostructures. However, alignment errors among the individual 2D nanostructures have been difficult to control due to some practical issues. In this work, we introduce a straightforward approach to drastically increase the overlay accuracy of sub-20 nm based on carefully designed alignmarks and calibrators. Three different types of 3D nanostructures whose designs are motivated from metamaterials and plasmonic structures have been demonstrated to verify the feasibility of the method, and the desired result has been achieved. We believe our work can provide a useful approach for building more advanced and complex 3D nanostructures.
URI
http://oasis.postech.ac.kr/handle/2014.oak/38962
DOI
10.1038/S41598-017-06833-5
ISSN
2045-2322
Article Type
Article
Citation
SCIENTIFIC REPORTS, vol. 7, no. 6668, page. 1 - 8, 2017-07
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