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Laser Plasma Sintering for Fabricating Indium Tin Oxide Thin Films SCIE SCOPUS

Title
Laser Plasma Sintering for Fabricating Indium Tin Oxide Thin Films
Authors
Park, TaesoonKim, Dongsik
Date Issued
2016-09-30
Publisher
Elsevier
Abstract
This paper introduces laser plasma sintering (LPS), and uses it to fabricate dense indiumtin oxide (ITO) thin films. LPS uses a nanosecond pulsed laser to generate an airborne laser-induced plasma (LIP) of high temperature and high pressure, which sinters the particles on the substrate. ITO thin films were fabricated by spin-coating ITO nanoparticle (NP) ink onto a substrate then using the LIP to sinter the NPs. The deposited NPs are sintered by the combined effect of the thermal radiation from the LIP and the impact of the shockwave. This LPS process could generate a polycrystalline structure with an average grain size of 280 nm. The electrical resistivity of the film was decreased to similar to 1/1000 of the initial value without losing transparency of the ITO film. The minimum resistivity of 1.6 x 10(-5) Omega.m was obtained significantly reducing the optical transparency of the ITO film. The thickness of the sintered layer and electrical resistivity could be controlled by adjusting the process parameters. LPS also strengthened the adhesion between the sintered film and the substrate significantly, compared with the conventional thermal or laser sintering process. This work suggests that LPS process can be an effective tool to fabricate various thin films with enhanced crystallinity and adhesion characteristics. (C) 2016 Elsevier B.V. All rights reserved.
URI
https://oasis.postech.ac.kr/handle/2014.oak/38141
DOI
10.1016/J.TSF.2016.06.060
ISSN
0040-6090
Article Type
Article
Citation
Thin Solid Films, vol. 615, page. 177 - 182, 2016-09-30
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