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Cited 11 time in webofscience Cited 6 time in scopus
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Improvement of work function and hole injection efficiency of graphene anode using CHF3 plasma treatment

Title
Improvement of work function and hole injection efficiency of graphene anode using CHF3 plasma treatment
Authors
Cho, HKim, SDHan, THSong, IByun, JWKim, YHKwon, SBae, SHChoi, HCAhn, JHLee, TW
POSTECH Authors
Choi, HCLee, TW
Date Issued
Mar-2015
Publisher
IOP PUBLISHING LTD
URI
http://oasis.postech.ac.kr/handle/2014.oak/36359
DOI
10.1088/2053-1583/2/1/014002
ISSN
2053-1583
Article Type
Article
Citation
2D MATERIALS, vol. 2, no. 1, 2015-03
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 LEE, TAE WOO
Dept of Materials Science & Enginrg
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