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원거리 플라즈마 화학증착을 이용한 저온 다결정 crystalline silicon by remote plasma chemical vapor deposition(RPCVD)

Title
원거리 플라즈마 화학증착을 이용한 저온 다결정 crystalline silicon by remote plasma chemical vapor deposition(RPCVD)
Authors
이일정
Date Issued
1994
Publisher
포항공과대학교
URI
http://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001897959
http://141.223.5.61//handle/2014.oak/3188
Article Type
Thesis
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