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ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistor

Title
ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistor
Authors
Lim, SJKwon, SJKim, H
POSTECH Authors
Kwon, SJKim, H
Date Issued
Jan-2008
Publisher
ELSEVIER SCIENCE SA
Keywords
atomic layer deposition; rf sputtering; ZnO; transparent TFT; RAY PHOTOELECTRON-SPECTROSCOPY; ZINC-OXIDE; ELECTRICAL-PROPERTIES; ROOM-TEMPERATURE; TRANSPARENT; ORIENTATION; EPITAXY; GROWTH; METAL
URI
http://oasis.postech.ac.kr/handle/2014.oak/30109
DOI
10.1016/J.TSF.2007.0
ISSN
0040-6090
Article Type
Article
Citation
THIN SOLID FILMS, vol. 516, no. 7, page. 1523 - 1528, 2008-01
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 KWON, SOON JU
Dept of Materials Science & Enginrg
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