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유화처리와 광CVD법 질화인막을 이용한 GaAs MISFET 제조 treated GaAs MISFETs with photochemical phosphorus-nitride gate insulators

Title
유화처리와 광CVD법 질화인막을 이용한 GaAs MISFET 제조 treated GaAs MISFETs with photochemical phosphorus-nitride gate insulators
Authors
최기환
Date Issued
1993
Publisher
포항공과대학교
URI
http://postech.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001897731
http://141.223.5.61//handle/2014.oak/2961
Article Type
Thesis
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