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PATTERN-TRANSFER FIDELITY IN SOFT LITHOGRAPHY: THE ROLE OF PATTERN DENSITY AND ASPECT RATIO

Title
PATTERN-TRANSFER FIDELITY IN SOFT LITHOGRAPHY: THE ROLE OF PATTERN DENSITY AND ASPECT RATIO
Authors
Lee, TWMitrofanov, OHsu, JWR
POSTECH Authors
Lee, TW
Date Issued
Oct-2005
Publisher
WILEY-V C H VERLAG GMBH
Keywords
2-PHOTON LITHOGRAPHY; SURFACE-TENSION; HIGH-RESOLUTION; PHOTOPOLYMERIZATION; MICROFABRICATION; DEFORMATION; PHOTORESIST; FEATURES; COLLAPSE; STAMP
URI
http://oasis.postech.ac.kr/handle/2014.oak/28869
DOI
10.1002/ADFM.2004002
ISSN
1616-301X
Article Type
Article
Citation
ADVANCED FUNCTIONAL MATERIALS, vol. 15, no. 10, page. 1683 - 1688, 2005-10
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 LEE, TAE WOO
Dept of Materials Science & Enginrg
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