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Cited 26 time in webofscience Cited 0 time in scopus
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E-beam lithography and electrodeposition fabrication of thick nanostructured devices

Title
E-beam lithography and electrodeposition fabrication of thick nanostructured devices
Authors
Lo, TNChen, YTChiu, CWLiu, CJWu, SRLin, IKSu, CIChang, WDHwu, YShew, BYChiang, CCJe, JHMargaritondo, G
POSTECH Authors
Je, JH
Date Issued
Jan-2007
Publisher
IOP PUBLISHING LTD
Keywords
X-RAY MICROSCOPY; ZONE PLATES; ELECTRON; NANOLITHOGRAPHY; METHACRYLATE; RESIST
URI
http://oasis.postech.ac.kr/handle/2014.oak/23379
DOI
10.1088/0022-3727/40
ISSN
0022-3727
Article Type
Article
Citation
JOURNAL OF PHYSICS D-APPLIED PHYSICS, vol. 40, no. 10, page. 3172 - 3176, 2007-01
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 JE, JUNG HO
Dept of Materials Science & Enginrg
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