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Kinetic plasma simulations for three dielectric etchers

Title
Kinetic plasma simulations for three dielectric etchers
Authors
Hong, YJKo, HSPark, GYLee, JK
Date Issued
Jan-2007
Publisher
ELSEVIER SCIENCE BV
Keywords
dual-frequency; capacitively coupled plasma; etcher; particle simulation; Monte Carlo collision; CAPACITIVELY COUPLED PLASMA
URI
http://oasis.postech.ac.kr/handle/2014.oak/23279
DOI
10.1016/J.CPC.2007.0
ISSN
0010-4655
Article Type
Article
Citation
COMPUTER PHYSICS COMMUNICATIONS, 177, 39815, 122, 123
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