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Cited 67 time in webofscience Cited 0 time in scopus
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Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement

Title
Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement
Authors
Chen, YTLo, TNChu, YSYi, JLiu, CJWang, JYWang, CLChiu, CWHua, TEHwu, YShen, QYin, GCLiang, KSLin, HMJe, JHMargaritondo, G
POSTECH Authors
Je, JH
Date Issued
Jan-2008
Publisher
IOP PUBLISHING LTD
Keywords
E-BEAM LITHOGRAPHY; ZONE PLATES; FABRICATION; RESOLUTION
URI
http://oasis.postech.ac.kr/handle/2014.oak/22558
DOI
10.1088/0957-4484/19
ISSN
0957-4484
Article Type
Article
Citation
NANOTECHNOLOGY, vol. 19, no. 39, 2008-01
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 JE, JUNG HO
Dept of Materials Science & Enginrg
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