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Sustainment of Plasma Density by a Low Magnetic Field in a Dual-Frequency Capacitively Coupled Plasma

Title
Sustainment of Plasma Density by a Low Magnetic Field in a Dual-Frequency Capacitively Coupled Plasma
Authors
Kim, DHRyu, CMLee, SHLee, JK이재구
Date Issued
Jan-2008
Publisher
INST PURE APPLIED PHYSICS
Abstract
Dual-frequency capacitively coupled plasmas (DF-CCPs) have been used to control the ion flux by the high-frequency source and the ion bombardment energy onto the electrode by the low-frequency (LF) source separately. However, an increase in the LF voltage. which extends the maximum ion energy to a higher value, causes the reduction of the bulk plasma length with a subsequent decrease of the plasma density. By using a one-dimensional particle-in-cell/Monte Carlo simulation code, the effect of the magnetic field on a DF-CCP is investigated to find whether the plasma can be sustained during the LF voltage increase. It is found that a low magnetic field can effectively maintain the plasma density and electron temperature constant with respect to the variation of the LF voltage.
Keywords
capacitively coupled plasma; dual-frequency; magnetic field; particle-in-cell simulation; RF DISCHARGE; MODEL; SIMULATION; SHEATH; ENERGY
URI
http://oasis.postech.ac.kr/handle/2014.oak/22454
DOI
10.1143/JJAP.47.7005
ISSN
0021-4922
Article Type
PROCEEDINGS PAPER
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