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Comparison of (hexafluoroacetylacetonate) Cu(vinyltrimethylsilane) and (hexafluoroacetylacetonate) Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper

Title
Comparison of (hexafluoroacetylacetonate) Cu(vinyltrimethylsilane) and (hexafluoroacetylacetonate) Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper
Authors
Park, MYSon, JHKang, SWRhee, SW
Date Issued
Jan-1999
Publisher
MATERIALS RESEARCH SOCIETY
Keywords
ADSORPTION/DESORPTION BEHAVIOR; PRECURSORS; SILICA; GROWTH; FTIR
URI
http://oasis.postech.ac.kr/handle/2014.oak/21059
ISSN
0884-2914
Article Type
Article
Citation
JOURNAL OF MATERIALS RESEARCH, vol. 14, no. 3, page. 975 - 979, 1999-01
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