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Evaluation of effective image blurring factors in the synchrotron proximity X-ray lithography

Title
Evaluation of effective image blurring factors in the synchrotron proximity X-ray lithography
Authors
Seo, YKim, O
POSTECH Authors
Kim, O
Date Issued
Jan-2000
Publisher
INST PURE APPLIED PHYSICS
Keywords
X-ray lithography; dose image; aerial image; blur; PEB; resist; CD; MASK
URI
http://oasis.postech.ac.kr/handle/2014.oak/19691
ISSN
0021-4922
Article Type
Article
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, vol. 39, no. 12B, page. 6942 - 6946, 2000-01
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 KIM, OHYUN
Dept of Electrical Enginrg
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