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Synchrotron X-ray Reflectivity for Characterization of the Initial ALD Growth of TaN

Title
Synchrotron X-ray Reflectivity for Characterization of the Initial ALD Growth of TaN
Authors
Park, YJLee, DRBaik, S
Date Issued
Aug-2011
Publisher
KOREAN PHYSICAL SOC
Keywords
TaN-ALD; X-ray reflectivity; ATOMIC LAYER DEPOSITION; THIN-FILMS; NUCLEATION; SCATTERING; PLASMA; OXIDE; METAL; SIO2
URI
http://oasis.postech.ac.kr/handle/2014.oak/17096
DOI
10.3938/JKPS.59.458
ISSN
0374-4884
Article Type
Article
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, vol. 59, no. 2, page. 458 - 460, 2011-08
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