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Cited 2 time in webofscience Cited 2 time in scopus
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Impurity-controlled Mo films as diffusion barriers for Cu metallization

Title
Impurity-controlled Mo films as diffusion barriers for Cu metallization
Authors
Gu, GHPark, SMPark, CG
POSTECH Authors
Park, CG
Date Issued
Jun-2012
Publisher
HANRIMWON PUBLISHING CO,.
Keywords
thin films; crystal growth; diffusion; crystal structure; transmission electron microscopy (TEM); THIN-FILMS; COPPER; OXIDATION; AL; SI; RELIABILITY; METALS; TA
URI
http://oasis.postech.ac.kr/handle/2014.oak/15777
DOI
10.1007/S12540-012-3021-3
ISSN
1598-9623
Article Type
Article
Citation
METALS AND MATERIALS INTERNATIONAL, vol. 18, no. 3, page. 517 - 520, 2012-06
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 PARK, CHAN GYUNG
Dept of Materials Science & Enginrg
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