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Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel

Title
Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel
Authors
Kang, HLee, CSKim, DYKim, JChoi, WKim, H
POSTECH Authors
Choi, WKim, H
Date Issued
Apr-2011
Publisher
ELSEVIER SCIENCE BV
Abstract
The thermal atomic layer deposition (Th-ALD) of TiO2 films on stainless steel for use as a photocatalyst was investigated and compared to plasma-enhanced ALD (PE-ALD) using the same precursor. Th-ALD TiO2 films were deposited on stainless steel using a Ti(NMe2)(4) [tetrakis(dimethylamido)Ti,TDMAT] precursor. The microstructure of the Th-ALD TiO2 films was greatly dependent on the growth temperature as an amorphous structure was obtained at 200 degrees C and a polycrystalline structure was achieved at temperatures above 300 degrees C. From the contact angle measurement of water, the crystalline TiO2 films exhibited super-hydrophilicity after UV irradiation. The anatase phase of both the Th- and PE-ALD TiO2 films grown on stainless steel showed higher photocatalytic abilities than the rutile phase grown at 400 degrees C. In addition, the anatase PE-ALD TiO2 film demonstrated a higher photocatalytic efficiency than the Th-ALD films. The photocatalytic efficiency of the Th-ALD TiO2 films was investigated as a function of film thickness and it was found that the efficiency was saturated above a film thickness of 120 nm. (C) 2011 Elsevier B.V. All rights reserved.
Keywords
Atomic layer deposition; Photocatalyst; TiO2; PLASMA-ENHANCED ALD; THIN-FILMS; THICKNESS; SUBSTRATE; CVD; SURFACES; COATINGS; GLASS
URI
http://oasis.postech.ac.kr/handle/2014.oak/13925
DOI
10.1016/J.APCATB.2011.03.010
ISSN
0926-3373
Article Type
Article
Citation
APPLIED CATALYSIS B-ENVIRONMENTAL, vol. 104, no. 1, page. 6 - 11, 2011-04
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 KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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