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Cited 36 time in webofscience Cited 39 time in scopus
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Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants

Title
Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
Authors
Maeng, WJPark, SJKim, H
POSTECH Authors
Kim, H
Date Issued
Jan-2006
Publisher
A V S AMER INST PHYSICS
URI
http://oasis.postech.ac.kr/handle/2014.oak/11283
DOI
10.1116/1.2345205
ISSN
1071-1023
Article Type
Article
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, no. 5, page. 2276 - 2281, 2006-01
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 KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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