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Cited 21 time in webofscience Cited 22 time in scopus
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Improved thermal stability of Ni silicide on Si (100) through reactive deposition of Ni

Title
Improved thermal stability of Ni silicide on Si (100) through reactive deposition of Ni
Authors
Kim, GBYoo, DJBaik, HKMyoung, JMLee, SMOh, SHPark, CG
POSTECH Authors
Park, CG
Date Issued
Jan-2003
Publisher
A V S AMER INST PHYSICS
URI
http://oasis.postech.ac.kr/handle/2014.oak/11266
DOI
10.1116/1.1539064
ISSN
1071-1023
Article Type
Article
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 21, no. 1, page. 319 - 322, 2003-01
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박찬경PARK, CHAN GYUNG
Dept of Materials Science & Enginrg
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