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Cited 11 time in webofscience Cited 12 time in scopus
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dc.contributor.authorMaeng, WJko
dc.contributor.authorKim, Hko
dc.date.available2015-06-25T02:15:05Z-
dc.date.created2009-02-28-
dc.date.issued2008-01-
dc.identifier.citationJOURNAL OF APPLIED PHYSICS, v.104, no.6-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000008239en_US
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/10603-
dc.description.statementofresponsibilityopenen_US
dc.format.extentpdfen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleThe effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.2978360-
dc.author.google"Maeng, WJen_US
dc.author.googleKim, H"en_US
dc.relation.volume104en_US
dc.relation.issue6en_US
dc.publisher.locationUSen_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.contributor.localauthorKim, H-
dc.contributor.nonIdAuthorMaeng, WJ-
dc.identifier.wosid000260119300108-
dc.date.tcdate2019-01-01-
dc.citation.number6-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume104-
dc.identifier.scopusid2-s2.0-54749090088-
dc.description.journalClass1-
dc.description.wostc10-
dc.description.scptc12*
dc.date.scptcdate2018-10-274*

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 KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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