Open Access System for Information Sharing

Login Library

 

Article
Cited 10 time in webofscience Cited 12 time in scopus
Metadata Downloads

The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation

Title
The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
Authors
Maeng, WJKim, H
POSTECH Authors
Kim, H
Date Issued
Jan-2008
Publisher
AMER INST PHYSICS
URI
http://oasis.postech.ac.kr/handle/2014.oak/10603
DOI
10.1063/1.2978360
ISSN
0021-8979
Article Type
Article
Citation
JOURNAL OF APPLIED PHYSICS, vol. 104, no. 6, 2008-01
Files in This Item:

qr_code

  • mendeley

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher

 KIM, HYUNGJUN
Dept of Materials Science & Enginrg
Read more

Altmetric

Views & Downloads

Browse