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Cited 73 time in webofscience Cited 74 time in scopus
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Thermal and plasma-enhanced ALD of Ta and Ti oxide thin films from alkylamide precursors

Title
Thermal and plasma-enhanced ALD of Ta and Ti oxide thin films from alkylamide precursors
Authors
Maeng, WJKim, H
POSTECH Authors
Kim, H
Date Issued
Jan-2006
Publisher
ELECTROCHEMICAL SOC INC
URI
http://oasis.postech.ac.kr/handle/2014.oak/10115
DOI
10.1149/1.2186427
ISSN
1099-0062
Article Type
Article
Citation
ELECTROCHEMICAL AND SOLID STATE LETTERS, no. 6, 2006-01
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 KIM, HYUNGJUN
Dept of Materials Science & Enginrg
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