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Cited 60 time in webofscience Cited 62 time in scopus
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dc.contributor.authorLee, HBRko
dc.contributor.authorKim, Hko
dc.date.available2015-06-25T01:50:41Z-
dc.date.created2009-02-28-
dc.date.issued2006-01-
dc.identifier.citationELECTROCHEMICAL AND SOLID STATE LETTERS, no.11-
dc.identifier.issn1099-0062-
dc.identifier.other2015-OAK-0000006218en_US
dc.identifier.urihttp://oasis.postech.ac.kr/handle/2014.oak/10113-
dc.description.statementofresponsibilityopenen_US
dc.format.extentpdfen_US
dc.languageEnglish-
dc.publisherELECTROCHEMICAL SOC INC-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleHigh-quality cobalt thin films by plasma-enhanced atomic layer deposition-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1149/1.2338777-
dc.author.google"Lee, HBRen_US
dc.author.googleKim, H"en_US
dc.relation.issue11en_US
dc.publisher.locationUSen_US
dc.relation.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.contributor.localauthorKim, H-
dc.contributor.nonIdAuthorLee, HBR-
dc.identifier.wosid000240500600021-
dc.date.tcdate2018-11-305-
dc.citation.number11-
dc.citation.titleELECTROCHEMICAL AND SOLID STATE LETTERS-
dc.identifier.scopusid2-s2.0-33748709832-
dc.description.journalClass1-
dc.description.wostc60-
dc.description.scptc62*
dc.date.scptcdate2018-10-274*

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Dept of Materials Science & Enginrg
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