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Defect Curing Effects on High-k Gate Stack (Al/Al2O3/Si-sub) by Using H2 Plasma Treatment and Rapid Thermal Anneal

Title
Defect Curing Effects on High-k Gate Stack (Al/Al2O3/Si-sub) by Using H2 Plasma Treatment and Rapid Thermal Anneal
Authors
BAEK, ROCK HYUNCHOI, KYEONG KEUNKANG, BOHYEONANJEHYUN
Date Issued
14-Feb-2020
Publisher
제 27회 반도체학술대회
URI
http://oasis.postech.ac.kr/handle/2014.oak/100683
Article Type
Conference
Citation
제 27회 반도체학술대회, 2020-02-14
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 BAEK, ROCK HYUN
Dept of Electrical Enginrg
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