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Issue Date	Title
-	A Study on the atomic layer deposited Tantalum carbo nitride films using TBTDET and hydrogen 제 35회 한국진공학회 하계 정기학술대회 이시우
2009-Aug	Al2O3 coated TiO2 Electrodes for Efficient Dye Sensitized Solar Cells The 4th Korea-Japan Bilateral Workshop on Dye-Sensitized and organic Soar cells, 2009-08-24 이시우; BojanKarunagaran; GanapathyVeerappan
2009-Jul	Al2O3 coated TiO2 Electrodes for Efficient Dye Sensitized Solar Cells AVS 9th International Conference on Atomic Layer Deposition, 2009-07-19 이시우; BojanKarunagaran; GanapathyVeerappan
-	ALCVD를 이용한 Zirconium Silicate 박막의 증착 반도체 학술대회 이시우
2009-Apr	ALD of TaCxNy for gate metal applications. The 5th 2009 KOREAN ALD WORKSHOP, 2009-04-17 이시우
-	Annealing effect of Molybdenum(Mo) electrode on improving interface properties between Mo and pentacene 2007년도 한국 재료 학회 추계 학술 발표대회 이시우
2010-Nov	Application of PEDOT:PSS and Carbon black composite as TCO free counter electrode in dye sensitized solar cells MRS(Material Research Society) Fall meeting, 2010-11-27 이시우; 김정민
2010-Jul	Application of stainless steel as counter electrode in dye sensitized solar cells 18th International Conference on Photochemical Conversion and Storage of Solar Energy, 2010-07-25 이시우; 김정민
-	Atomic layer chemical vapor deposition (ALCVD) of hafnium silicate films for nano CMOS gate dielectric applications Korea-Japan Symposium on Materials (O-1) 이시우
-	Atomic layer chemical vapor deposition (ALCVD) of hafnium silicate films using HfCl4 and Si(n-OC4H9)4 Atomic Layer Deposition (ALD 2003) 이시우
-	Atomic layer chemical vapor deposition (ALCVD) of Hafnium silicate high-k gate dielectric for next generation nano devices AVS 5th International Conference on Atomic Layer Deposition 이시우
-	Atomic layer chemical vapor deposition (ALCVD) of Hafnium silicate high-k gate dielectric using a single precursor HfCl2[N{Si(CH3)3}2]2 이시우
2009-Apr	Atomic layer chemical vapor deposition for silicon nano devices 한국화학공학회, 2009-04-24 이시우
-	Atomic layer deposition of hafnia alumina nano laminate thin films The 4th Asia-Pacific Chemical Reaction Engineering Symposium (APCRE'05) 이시우
-	Atomic layer deposition of hafnium silicate films using dichlorobis[bis(trimethylsilyl)amido]hafnium and water Atomic Layer Deposition (ALD 2003) 이시우
-	Atomic layer deposition of hafnium silicate thin films using a novel single precursor The 4th Asia-Pacific Chemical Reaction Engineering Symposium (APCRE'05) 이시우
-	Atomic Layer Deposition of TaC gate electrode with TBTDET 2009년도 한국재료학회 춘계학술발표대회 및 제16회 신소재 심포지엄 이시우; 조기희
-	Atomic Layer Deposition of TaC gater electrode with TBTDET 2009년도 한국재료학회 춘계학술발표대회 및 제16회 신소재 심포지엄 조기희; 이시우
2009-Oct	Atomic Layer Deposition of Thin Al2O3 Barrier Layers for Efficient Dye Sensitized Solar Cells 2009년 가을 총회 및 학술대회 광기술 심포지엄, 2009-10-22 이시우; BojanKarunagaran; GanapathyVeerappan
-	Atomic Layer Deposition of Zirconium Silicate Films Using Chloride and Alkoxide Compounds Proc. of AVS Topical Conference(ALD 2002) 이시우

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