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Showing results 1 to 6 of 6
Issue DateTitle
2009-Nov
Chemical vapor deposition of TaCxNy films using tert-butylimido tris-diethylamido tantalum (TBTDET): reaction mechanism and film charateristics

2009년도 한국재료학회 추계학술발표대회 및 제17회 신소재 심포지엄, 2009-11-05

이시우; 김석훈

2008-Aug
In-situ synchrotron X-ray scattering study on the initial structure of Ta(C)N Atomic Layer Deposition films for the electronic devices.

KJC-FE07, 2008-08-06

백성기; 박용준; 김석훈; 이동열; 송문균; 이시우

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In-situ synchrotron X-ray scattering study on the initial structure of Ta(C)N Atomic Layer Deposition films for the electronic devices

KJCFE07

박용준; 김석훈; 이동렬; 송문균; 이시우; 백성기

2010-Jun
PE(plasma enhanced) ALD and thermal ALD of TaCxNy films with TBTDET(tert-butylimido tris-diethylamido tantalum) and H2/NH3

10th International Conference on Atomic Layer Deposition, 2010-06-22

이시우; 김석훈

2010
TBTDET 전구체와 다양한 반응기체를 이용한 탄탈륨 탄화질화막 (TaCxNy) 박막의 화학기상증착공정 연구

Thesis(Doctor), 2010

김석훈

2003
Tetrakis-diethylmido hafnium, Trimethyl aluminum 그리고 Water을 이용한 hafnia-alumina nano laminate 박막의 원자층 화학증착

Thesis(Master), 2003

김석훈
1

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